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Home » Faculty » Colin Wolden

Contact Info

423 Alderson Hall
Chemical and Biological Engineering Department
Colorado School of Mines
Golden, CO 80401
Office: (303) 273-3544
FAX: (303) 273-3730
cwolden@mines.edu

Research Group

Wolden Research Group Page

Dr. Rachel Morrish: Research Associate
Chris Lange: Colorado School of Mines
Chi-Ping Li: National Taiwan U. of Science and Technology
Rakhi Patel: U. Institute of Chemical Technology, Mumbai India
Sanket Kelkar: Institute of Chemical Technology, Mumbai India
Sara Chmelka: Undergrad
Sterling Parks: Undergrad
David Chiavetta: Undergrad
Alex Sale: Undergrad
Donal Finegan: Undergrad

Honors & Awards

2010 E.T.S. Walton Fellow, University College Dublin
2001 NSF CAREER Award
2000, 2001 3M Untenured Faculty Award

Colin Wolden

Colin Wolden

Weaver Distinguished Professor

BS - University of Minnesota
MS - MIT School of Chemical Engineering Practice
PhD - MIT

Research Description

Our research interests are in the area of the thin film synthesis. Deposition techniques include plasma-enhanced chemical vapor deposition (PECVD), CVD, sputtering, and electrodeposition. A central theme is developing novel processing techniques that impart nanoscale control while retaining high rate for the efficient synthesis of mesoscale structures (0.05 -10 mm). Thin films are ubiquitous in advanced technology, and the materials we synthesize serve as integral components in photovoltaics, membranes, opto-electronics, electrochromics, thin film batteries, functional coatings, and catalysis. Investigation of these deposition processes is guided by detailed reactive flow modeling and experimental measures of both gas-phase and surface kinetics. In-situ process diagnostics and ex-situ materials characterization are used to gain a fundamental understanding of the process–structure–performance relationships in these systems.

Visit our lab page for a more information on current projects in the lab.

selected Publications

P. C. Rowlette, M. Canon, C. A. Wolden, "Digital control of SiO2 film deposition at room temperature", J. Phys. Chem. C 113, 6906 (2009)

M. T. Seman, D. N. Richards, P. Rowlette, and C. A. Wolden, "An analysis of the deposition mechanisms involved during self-limiting growth of aluminum oxide by pulsed PECVD", Chem. Vap. Deposition 14, 296 (2008).

M. Seman, J. J. Robbins, S. Agarwal, and C. A. Wolden, "Self-limiting growth of tantalum oxide thin films by pulsed plasma-enhanced chemical vapor deposition", Appl. Phys. Lett. 90,131504 (2007).

S. Kosaraju, I. Repins and C. A. Wolden, "Formation of chalcogen containing plasmas and their use in the synthesis of photovoltaic absorbers", J. Vac. Sci. Technol. A 23, 1202 (2005).

J. M. Kestner, S. McElvain, S. Kelly, L. M. Woods, T. R. Ohno, and C. A. Wolden, "An experimental and modeling analysis of vapor transport deposition of cadmium telluride", Sol. Energy Mater. Sol. Cells 83, 55-65 (2004).

J. J. Robbins and C. A. Wolden, "High mobility oxides: engineered structures to overcome intrinsic performance limitations", Appl. Phys. Lett. 83, 3933-3935 (2003).

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