Colin Wolden
Weaver Distinguished Professor
Research Description
Our research interests are in the area of the thin film synthesis. Deposition
techniques include plasma-enhanced chemical vapor deposition (PECVD),
CVD, sputtering, and electrodeposition. A central theme is developing
novel processing techniques that impart nanoscale control while retaining
high rate for the efficient synthesis of mesoscale structures (50 - 1000
nm). Thin films are ubiquitous in advanced technology, and the materials
we synthesize serve as integral components in photovoltaics, membranes,
opto-electronics, electrochromics, thin film batteries, functional coatings,
and catalysis. Investigation of these deposition processes is guided by
detailed reactive flow modeling and experimental measures of both gas-phase
and surface kinetics. In-situ process diagnostics and ex-situ materials
characterization are used to gain a fundamental understanding of the process–structure–performance
relationships in these systems.
Visit our lab page for a more information on current projects in the
lab.
Selected Publications
C.-P. Li, C. A. Wolden, A. C. Dillon, R. C. Tenent, "Electrochromic films produced by ultrasonic spray deposition of tungsten oxide nanoparticles", Solar Energy Mater. Solar Cells 99, 50, (2012).
C. A. Wolden, J. Kurtin, J. B. Baxter, I. Repins, S. E. Shaheen, J. T. Torvik, A. A. Rockett, V. M. Fthenakis and E. S. Aydil, "Photovoltaic manufacturing: Present status, future prospects, and research needs", J. Vac. Sci. Technol. A 29, 030801, (2011).
S. K. Gade, S. J. Chmelka, S. Parks, J. D. Way and C. A. Wolden, "Dense carbide/metal composite membranes for hydrogen separations without platinum group metals", Adv. Mater. 23, 3585, (2011).
R. Morrish, M. Rahman, J. M. D. MacElroy and C. A. Wolden, "Activation of hematite nanorod arrays for photoelectrochemical water splitting", ChemSusChem 4, 474, (2011).
R. P. Patel, D. Chiavetta and C. A. Wolden, "Dielectric performance of hybrid alumina-silicone nanolaminates synthesized by plasma enhanced chemical vapor deposition", J. vac. Sci. Technol. A 29, 061508 (2011).